Pulsed Laser Deposition Chamber

Room , IPST

 • UHV chamber for the deposition of thin films as well as nanowires in a controlled atmosphere.

 • KrF pulsed laser is employed to ablate the target and deposit films. The substrate temperature can be controlled from room temperature upto ~1000°C.

Furnace Lab

Room , IPST

 • Box furnace can heat-treat the specimen in air.

Furnace Lab

Room , IPST

 • Three zone furnace supply better control of the temperature for the controlled synthesis of nanostructures.

Furnace Lab

Room , IPST

 • KrF pulsed laser can be combined with the furnace set-up to achieve laser ablation assisted vapor transport deposition.

Furnace Lab

Room , IPST

 •Thermal evaporation system including 4 sources.

 • Most metal materials can be deposited using this system.

Furnace Lab

Room , IPST

 •The glove box is a sealed container that allows manipulation of objects in a separate atmosphere. It is usually used to keep objects from the influence of oxygen and water vapor.